Detailed material performance parameters for our high purity quartz sand, precision engineered components, and advanced silicon feedstock platforms.
The following indicative specifications represent typical material performance. Customized grades targeting specific impurity reductions or particle size distributions can be developed based on customer requirements.
Solar crucibles, electronic glass, fused silica components
| Parameter | Typical Specification |
|---|---|
| SiO₂ Purity | ≥ 99.998 % |
| Fe₂O₃ | ≤ 8 – 12 ppm |
| Al₂O₃ | ≤ 15 – 25 ppm |
| TiO₂ | ≤ 2 – 5 ppm |
| CaO | ≤ 5 ppm |
| Na₂O + K₂O | ≤ 8 ppm |
| Loss on Ignition | ≤ 0.05 % |
| Particle Size | Customized (100 µm – 500 µm typical) |
| Bulk Density | 1.45 – 1.60 g/cm³ |
| Moisture | ≤ 0.02 % |
Semiconductor quartzware, optical fibre preforms
| Parameter | Typical Specification |
|---|---|
| SiO₂ Purity | ≥ 99.999 % |
| Fe₂O₃ | ≤ 3 – 5 ppm |
| Al₂O₃ | ≤ 8 – 12 ppm |
| TiO₂ | ≤ 1 – 2 ppm |
| CaO | ≤ 2 ppm |
| Alkali Metals | ≤ 3 ppm |
| Loss on Ignition | ≤ 0.03 % |
| Particle Size | Ultra-controlled grading available |
| Bulk Density | 1.48 – 1.62 g/cm³ |
| Moisture | ≤ 0.01 % |
Standard baseline for engineered fused quartz components
| Characteristic | Specification |
|---|---|
| Softening Point | ~1680°C |
| Thermal Shock Resistance | High |
| Metallic Contamination | Ultra-low |
| Surface Finish | Semiconductor grade polishing available |
| Dimensional Tolerance | Customer specified (Precision machined) |
| Chemical Resistance | Excellent against acids and plasma environments |
General quality parameters for silicon feedstock
| Parameter | Description & Target |
|---|---|
| Resistivity Control | Controlled resistivity grades customized to application requirements. |
| Crystal Integrity | High structural perfection, minimizing lattice defects for optimal slicing. |
| Purity Levels | Ultra-low metallic contamination, ensuring high minority carrier lifetimes. |
| Thermal Stability | Stable performance in Czochralski (CZ) and Float Zone (FZ) ingot growth. |
Custom formulation and particle morphology optimization available.
We work collaboratively with our clients to develop tailored material solutions, optimizing particle morphology, reducing targeted impurities, and fabricating highly complex components.